ChipNeMo: Domain-Adapted LLMs for Chip Design

ChipNeMo aims to explore the applications of large language models (LLMs) for industrial chip design. Instead of directly deploying off-the-shelf commercial or open-source LLMs, we instead adopt the following domain adaptation techniques: custom tokenizers, domain-adaptive continued pretraining, supervised fine-tuning (SFT) with domain-specific instructions, and domain-adapted retrieval models. We evaluate these methods on three selected LLM applications for chip design: an engineering assistant chatbot, EDA script generation, and bug summarization and analysis. Our results show that these domain adaptation techniques enable significant LLM performance improvements over general-purpose base models across the three evaluated applications, enabling up to 5x model size reduction with similar or better performance on a range of design tasks. Our findings also indicate that there's still room for improvement between our current results and ideal outcomes. We believe that further investigation of domain-adapted LLM approaches will help close this gap in the future.

VerilogEval: Evaluating Large Language Models for Verilog Code Generation

The increasing popularity of large language models (LLMs) has paved the way for their application in diverse domains. This paper proposes a benchmarking framework tailored specifically for evaluating LLM performance in the context of Verilog code generation for hardware design and verification. We present a comprehensive evaluation dataset consisting of 156 problems from the Verilog instructional website HDLBits. The evaluation set consists of a diverse set of Verilog code generation tasks, ranging from simple combinational circuits to complex finite state machines. The Verilog code completions can be automatically tested for functional correctness by comparing the transient simulation outputs of the generated design with a golden solution. We also demonstrate that the Verilog code generation capability of pretrained language models could be improved with supervised fine-tuning by bootstrapping with LLM generated synthetic problem-code pairs.

HEAT: Hardware-Efficient Automatic Tensor Decomposition for Transformer Compression

Transformers have attained superior performance in natural language processing and computer vision. Their self-attention and feedforward layers are overparameterized, limiting inference speed and energy efficiency. Tensor decomposition is a promising technique to reduce parameter redundancy by leveraging tensor algebraic properties to express the parameters in a factorized form. Prior efforts used manual or heuristic factorization settings without hardware-aware customization, resulting in poor hardware efficiencies and large performance degradation. In this work, we propose a hardware-aware tensor decomposition framework, dubbed HEAT, that enables efficient exploration of the exponential space of possible decompositions and automates the choice of tensorization shape and decomposition rank with hardware-aware co-optimization. We jointly investigate tensor contraction path optimizations and a fused Einsum mapping strategy to bridge the gap between theoretical benefits and real hardware efficiency improvement. Our two-stage knowledge distillation flow resolves the trainability bottleneck and thus significantly boosts the final accuracy of factorized Transformers. Overall, we experimentally show that our hardware-aware factorized BERT variants reduce the energy-delay product by 5.7x with less than 1.1% accuracy loss and achieve a better efficiency-accuracy Pareto frontier than hand-tuned and heuristic baselines.

An Adversarial Active Sampling-based Data Augmentation Framework for Manufacturable Chip Design

Lithography modeling is a crucial problem in chip design to ensure a chip design mask is manufacturable. It requires rigorous simulations of optical and chemical models that are computationally expensive. Recent developments in machine learning have provided alternative solutions in replacing the time-consuming lithography simulations with deep neural networks. However, the considerable accuracy drop still impedes its industrial adoption. Most importantly, the quality and quantity of the training dataset directly affect the model performance. To tackle this problem, we propose a litho-aware data augmentation (LADA) framework to resolve the dilemma of limited data and improve the machine learning model performance. First, we pretrain the neural networks for lithography modeling and a gradient-friendly StyleGAN2 generator. We then perform adversarial active sampling to generate informative and synthetic in-distribution mask designs. These synthetic mask images will augment the original limited training dataset used to finetune the lithography model for improved performance. Experimental results demonstrate that LADA can successfully exploits the neural network capacity by narrowing down the performance gap between the training and testing data instances.

Large Scale Mask Optimization Via Convolutional Fourier Neural Operator and Litho-Guided Self Training

Machine learning techniques have been extensively studied for mask optimization problems, aiming at better mask printability, shorter turnaround time, better mask manufacturability, and so on. However, most of these researches are focusing on the initial solution generation of small design regions. To further realize the potential of machine learning techniques on mask optimization tasks, we present a Convolutional Fourier Neural Operator (CFNO) that can efficiently learn layout tile dependencies and hence promise stitch-less large-scale mask optimization with the limited intervention of legacy tools. We discover the possibility of litho-guided self-training (LGST) through a trained machine learning model when solving non-convex optimization problems, which allows iterative model and dataset update and brings significant model performance improvement. Experimental results show that, for the first time, our machine learning-based framework outperforms state-of-the-art academic numerical mask optimizers with an order of magnitude speedup.

Optimal Clipping and Magnitude-aware Differentiation for Improved Quantization-aware Training

Data clipping is crucial in reducing noise in quantization operations and improving the achievable accuracy of quantization-aware training (QAT). Current practices rely on heuristics to set clipping threshold scalars and cannot be shown to be optimal. We propose Optimally Clipped Tensors And Vectors (OCTAV), a recursive algorithm to determine MSE-optimal clipping scalars. Derived from the fast Newton-Raphson method, OCTAV finds optimal clipping scalars on the fly, for every tensor, at every iteration of the QAT routine. Thus, the QAT algorithm is formulated with provably minimum quantization noise at each step. In addition, we reveal limitations in common gradient estimation techniques in QAT and propose magnitude-aware differentiation as a remedy to further improve accuracy. Experimentally, OCTAV-enabled QAT achieves state-of-the-art accuracy on multiple tasks. These include training-from-scratch and retraining ResNets and MobileNets on ImageNet, and Squad fine-tuning using BERT models, where OCTAV-enabled QAT consistently preserves accuracy at low precision (4-to-6-bits). Our results require no modifications to the baseline training recipe, except for the insertion of quantization operations where appropriate.

Generic Lithography Modeling with Dual-band Optics-Inspired Neural Networks

Lithography simulation is a critical step in VLSI design and optimization for manufacturability. Existing solutions for highly accurate lithography simulation with rigorous models are computationally expensive and slow, even when equipped with various approximation techniques. Recently, machine learning has provided alternative solutions for lithography simulation tasks such as coarse-grained edge placement error regression and complete contour prediction. However, the impact of these learning-based methods has been limited due to restrictive usage scenarios or low simulation accuracy. To tackle these concerns, we introduce an dual-band optics-inspired neural network design that considers the optical physics underlying lithography. To the best of our knowledge, our approach yields the first published via/metal layer contour simulation at 1nm^2/pixel resolution with any tile size. Compared to previous machine learning based solutions, we demonstrate that our framework can be trained much faster and offers a significant improvement on efficiency and image quality with 20X smaller model size. We also achieve 85X simulation speedup over traditional lithography simulator with 1% accuracy loss.

GATSPI: GPU Accelerated Gate-Level Simulation for Power Improvement

In this paper, we present GATSPI, a novel GPU accelerated logic gate simulator that enables ultra-fast power estimation for industry sized ASIC designs with millions of gates. GATSPI is written in PyTorch with custom CUDA kernels for ease of coding and maintainability. It achieves simulation kernel speedup of up to 1668X on a single-GPU system and up to 7412X on a multiple-GPU system when compared to a commercial gate-level simulator running on a single CPU core. GATSPI supports a range of simple to complex cell types from an industry standard cell library and SDF conditional delay statements without requiring prior calibration runs and produces industry-standard SAIF files from delay-aware gate-level simulation. Finally, we deploy GATSPI in a glitch-optimization flow, achieving a 1.4% power saving with a 449X speedup in turnaround time compared to a similar flow using a commercial simulator.

NVCell: Standard Cell Layout in Advanced Technology Nodes with Reinforcement Learning

High quality standard cell layout automation in advanced technology nodes is still challenging in the industry today because of complex design rules. In this paper we introduce an automatic standard cell layout generator called NVCell that can generate layouts with equal or smaller area for over 90% of single row cells in an industry standard cell library on an advanced technology node. NVCell leverages reinforcement learning (RL) to fix design rule violations during routing and to generate efficient placements.