ESPACE: Dimensionality Reduction of Activations for Model Compression

We propose ESPACE, an LLM compression technique based on dimensionality reduction of activations. Unlike prior works on weight-centric tensor decomposition, ESPACE projects activations onto a pre-calibrated set of principal components. The activation-centrality of the approach enables retraining LLMs with no loss of expressivity; while at inference, weight decomposition is obtained as a byproduct of matrix multiplication associativity. Theoretical results on the construction of projection matrices with optimal computational accuracy are provided. Experimentally, we find ESPACE enables 50% compression of GPT3, Llama2, and Nemotron4 models with small accuracy degradation, as low as a 0.18 perplexity increase on GPT3-22B. At lower compression rates of 20% to 40%, ESPACE drives GPT3 models to outperforming their baseline, by up to a 0.38 decrease in perplexity for GPT3-8B. ESPACE also reduces GEMM execution time and prefill inference latency on existing hardware. Comparison with related works on compressing Llama2-7B via matrix factorization shows that ESPACE is a first step in advancing the state-of-the-art in tensor decomposition compression of LLMs.

Revisiting VerilogEval: Newer LLMs, In-Context Learning, and Specification-to-RTL Tasks

The application of large-language models (LLMs) to digital hardware code generation is an emerging field. Most LLMs are primarily trained on natural language and software code. Hardware code, such as Verilog, represents only a small portion of the training data and few hardware benchmarks exist. To address this gap, the open-source VerilogEval benchmark was released in 2023, providing a consistent evaluation framework for LLMs on code completion tasks. It was tested on state-of-the-art models at the time including GPT-4. However, VerilogEval and other Verilog generation benchmarks lack failure analysis and, in present form, are not conducive to exploring prompting techniques. Also, since VerilogEval's release, both commercial and open-source models have seen continued development. In this work, we evaluate new commercial and open-source models of varying sizes against an improved VerilogEval benchmark suite. We enhance VerilogEval's infrastructure and dataset by automatically classifying failures, introduce new prompts for supporting in-context learning (ICL) examples, and extend the supported tasks to specification-to-RTL translation. We find a measurable improvement in commercial state-of-the-art models, with GPT-4 Turbo achieving a 59% pass rate on spec-to-RTL tasks. We also study the performance of open-source and domain-specific models that have emerged, and demonstrate that models can benefit substantially from ICL. We find that recently-released Llama 3.1 405B achieves a pass rate of 58%, effectively matching that of GPT-4 Turbo, and that the much smaller domain-specific RTL-Coder 6.7B models achieve an impressive 37% pass rate. However, prompt engineering is key to achieving good pass rates, and varies widely with model and task. A benchmark infrastructure that allows for prompt engineering and failure analysis is key to continued model development and deployment.

VerilogCoder: Autonomous Verilog Coding Agents with Graph-based Planning and Abstract Syntax Tree (AST)-based Waveform Tracing Tool

Due to the growing complexity of modern Integrated Circuits (ICs), automating hardware design can prevent a significant amount of human error from the engineering process and result in less errors. Verilog is a popular hardware description language for designing and modeling digital systems; thus, Verilog generation is one of the emerging areas of research to facilitate the design process. In this work, we propose VerilogCoder, a system of multiple Artificial Intelligence (AI) agents for Verilog code generation, to autonomously write Verilog code and fix syntax and functional errors using collaborative Verilog tools (i.e., syntax checker, simulator, and waveform tracer). Firstly, we propose a task planner that utilizes a novel Task and Circuit Relation Graph retrieval method to construct a holistic plan based on module descriptions. To debug and fix functional errors, we develop a novel and efficient abstract syntax tree (AST)-based waveform tracing tool, which is integrated within the autonomous Verilog completion flow. The proposed methodology successfully generates 94.2% syntactically and functionally correct Verilog code, surpassing the state-of-the-art methods by 33.9% on the VerilogEval-Human v2 benchmark.

ChipNeMo: Domain-Adapted LLMs for Chip Design

ChipNeMo aims to explore the applications of large language models (LLMs) for industrial chip design. Instead of directly deploying off-the-shelf commercial or open-source LLMs, we instead adopt the following domain adaptation techniques: custom tokenizers, domain-adaptive continued pretraining, supervised fine-tuning (SFT) with domain-specific instructions, and domain-adapted retrieval models. We evaluate these methods on three selected LLM applications for chip design: an engineering assistant chatbot, EDA script generation, and bug summarization and analysis. Our results show that these domain adaptation techniques enable significant LLM performance improvements over general-purpose base models across the three evaluated applications, enabling up to 5x model size reduction with similar or better performance on a range of design tasks. Our findings also indicate that there's still room for improvement between our current results and ideal outcomes. We believe that further investigation of domain-adapted LLM approaches will help close this gap in the future.

VerilogEval: Evaluating Large Language Models for Verilog Code Generation

The increasing popularity of large language models (LLMs) has paved the way for their application in diverse domains. This paper proposes a benchmarking framework tailored specifically for evaluating LLM performance in the context of Verilog code generation for hardware design and verification. We present a comprehensive evaluation dataset consisting of 156 problems from the Verilog instructional website HDLBits. The evaluation set consists of a diverse set of Verilog code generation tasks, ranging from simple combinational circuits to complex finite state machines. The Verilog code completions can be automatically tested for functional correctness by comparing the transient simulation outputs of the generated design with a golden solution. We also demonstrate that the Verilog code generation capability of pretrained language models could be improved with supervised fine-tuning by bootstrapping with LLM generated synthetic problem-code pairs.

HEAT: Hardware-Efficient Automatic Tensor Decomposition for Transformer Compression

Transformers have attained superior performance in natural language processing and computer vision. Their self-attention and feedforward layers are overparameterized, limiting inference speed and energy efficiency. Tensor decomposition is a promising technique to reduce parameter redundancy by leveraging tensor algebraic properties to express the parameters in a factorized form. Prior efforts used manual or heuristic factorization settings without hardware-aware customization, resulting in poor hardware efficiencies and large performance degradation. In this work, we propose a hardware-aware tensor decomposition framework, dubbed HEAT, that enables efficient exploration of the exponential space of possible decompositions and automates the choice of tensorization shape and decomposition rank with hardware-aware co-optimization. We jointly investigate tensor contraction path optimizations and a fused Einsum mapping strategy to bridge the gap between theoretical benefits and real hardware efficiency improvement. Our two-stage knowledge distillation flow resolves the trainability bottleneck and thus significantly boosts the final accuracy of factorized Transformers. Overall, we experimentally show that our hardware-aware factorized BERT variants reduce the energy-delay product by 5.7x with less than 1.1% accuracy loss and achieve a better efficiency-accuracy Pareto frontier than hand-tuned and heuristic baselines.

An Adversarial Active Sampling-based Data Augmentation Framework for Manufacturable Chip Design

Lithography modeling is a crucial problem in chip design to ensure a chip design mask is manufacturable. It requires rigorous simulations of optical and chemical models that are computationally expensive. Recent developments in machine learning have provided alternative solutions in replacing the time-consuming lithography simulations with deep neural networks. However, the considerable accuracy drop still impedes its industrial adoption. Most importantly, the quality and quantity of the training dataset directly affect the model performance. To tackle this problem, we propose a litho-aware data augmentation (LADA) framework to resolve the dilemma of limited data and improve the machine learning model performance. First, we pretrain the neural networks for lithography modeling and a gradient-friendly StyleGAN2 generator. We then perform adversarial active sampling to generate informative and synthetic in-distribution mask designs. These synthetic mask images will augment the original limited training dataset used to finetune the lithography model for improved performance. Experimental results demonstrate that LADA can successfully exploits the neural network capacity by narrowing down the performance gap between the training and testing data instances.

Large Scale Mask Optimization Via Convolutional Fourier Neural Operator and Litho-Guided Self Training

Machine learning techniques have been extensively studied for mask optimization problems, aiming at better mask printability, shorter turnaround time, better mask manufacturability, and so on. However, most of these researches are focusing on the initial solution generation of small design regions. To further realize the potential of machine learning techniques on mask optimization tasks, we present a Convolutional Fourier Neural Operator (CFNO) that can efficiently learn layout tile dependencies and hence promise stitch-less large-scale mask optimization with the limited intervention of legacy tools. We discover the possibility of litho-guided self-training (LGST) through a trained machine learning model when solving non-convex optimization problems, which allows iterative model and dataset update and brings significant model performance improvement. Experimental results show that, for the first time, our machine learning-based framework outperforms state-of-the-art academic numerical mask optimizers with an order of magnitude speedup.

Optimal Clipping and Magnitude-aware Differentiation for Improved Quantization-aware Training

Data clipping is crucial in reducing noise in quantization operations and improving the achievable accuracy of quantization-aware training (QAT). Current practices rely on heuristics to set clipping threshold scalars and cannot be shown to be optimal. We propose Optimally Clipped Tensors And Vectors (OCTAV), a recursive algorithm to determine MSE-optimal clipping scalars. Derived from the fast Newton-Raphson method, OCTAV finds optimal clipping scalars on the fly, for every tensor, at every iteration of the QAT routine. Thus, the QAT algorithm is formulated with provably minimum quantization noise at each step. In addition, we reveal limitations in common gradient estimation techniques in QAT and propose magnitude-aware differentiation as a remedy to further improve accuracy. Experimentally, OCTAV-enabled QAT achieves state-of-the-art accuracy on multiple tasks. These include training-from-scratch and retraining ResNets and MobileNets on ImageNet, and Squad fine-tuning using BERT models, where OCTAV-enabled QAT consistently preserves accuracy at low precision (4-to-6-bits). Our results require no modifications to the baseline training recipe, except for the insertion of quantization operations where appropriate.

Generic Lithography Modeling with Dual-band Optics-Inspired Neural Networks

Lithography simulation is a critical step in VLSI design and optimization for manufacturability. Existing solutions for highly accurate lithography simulation with rigorous models are computationally expensive and slow, even when equipped with various approximation techniques. Recently, machine learning has provided alternative solutions for lithography simulation tasks such as coarse-grained edge placement error regression and complete contour prediction. However, the impact of these learning-based methods has been limited due to restrictive usage scenarios or low simulation accuracy. To tackle these concerns, we introduce an dual-band optics-inspired neural network design that considers the optical physics underlying lithography. To the best of our knowledge, our approach yields the first published via/metal layer contour simulation at 1nm^2/pixel resolution with any tile size. Compared to previous machine learning based solutions, we demonstrate that our framework can be trained much faster and offers a significant improvement on efficiency and image quality with 20X smaller model size. We also achieve 85X simulation speedup over traditional lithography simulator with 1% accuracy loss.