Active Generative Adversarial Network for Image Classification

Sufficient supervised information is crucial for any machine learning models to boost performance. However, labeling data is expensive and sometimes difficult to obtain. Active learning is an approach to acquire annotations for data from a human oracle by selecting informative samples with a high probability to enhance performance. In recent emerging studies, a generative adversarial network (GAN) has been integrated with active learning to generate good candidates to be presented to the oracle. In this paper, we propose a novel model that is able to obtain labels for data in a cheaper manner without the need to query an oracle. In the model, a novel reward for each sample is devised to measure the degree of uncertainty, which is obtained from a classifier trained with existing labeled data. This reward is used to guide a conditional GAN to generate informative samples with a higher probability for a certain label. With extensive evaluations, we have confirmed the effectiveness of the model, showing that the generated samples are capable of improving the classification performance in popular image classification tasks.

Data Efficient Lithography Modeling with Transfer Learning and Active Data Selection

Lithography simulation is one of the key steps in physical verification, enabled by the substantial optical and resist models. A resist model bridges the aerial image simulation to printed patterns. While the effectiveness of learning-based solutions for resist modeling has been demonstrated, they are considerably data-demanding. Meanwhile, a set of manufactured data for a specific lithography configuration is only valid for the training of one single model, indicating low data efficiency. Due to the complexity of the manufacturing process, obtaining enough data for acceptable accuracy becomes very expensive in terms of both time and cost, especially during the evolution of technology generations when the design space is intensively explored. In this work, we propose a new resist modeling framework for contact layers, utilizing existing data from old technology nodes and active selection of data in a target technology node, to reduce the amount of data required from the target lithography configuration. Our framework based on transfer learning and active learning techniques is effective within a competitive range of accuracy, i.e., 3-10X reduction on the amount of training data with comparable accuracy to the state-of-the-art learning approach.