SEMU-Net: A Segmentation-based Corrector for Fabrication Process Variations of Nanophotonics with Microscopic Images

Integrated silicon photonic devices, which manipulate light to transmit and process information on a silicon-on-insulator chip, are highly sensitive to structural variations. Minor deviations during nanofabrication-the precise process of building structures at the nanometer scale-such as over- or under-etching, corner rounding, and unintended defects, can significantly impact performance. To address these challenges, we introduce SEMU-Net, a comprehensive set of methods that automatically segments scanning electron microscope images (SEM) and uses them to train two deep neural network models based on U-Net and its variants. The predictor model anticipates fabrication-induced variations, while the corrector model adjusts the design to address these issues, ensuring that the final fabricated structures closely align with the intended specifications. Experimental results show that the segmentation U-Net reaches an average IoU score of 99.30%, while the corrector attention U-Net in a tandem architecture achieves an average IoU score of 98.67%.

Improving Fabrication Fidelity of Integrated Nanophotonic Devices Using Deep Learning

Next-generation integrated nanophotonic device designs leverage advanced optimization techniques such as inverse design and topology optimization which achieve high performance and extreme miniaturization by optimizing a massively complex design space enabled by small feature sizes. However, unless the optimization is heavily constrained, the generated small features are not reliably fabricated, leading to optical performance degradation. Even for simpler, conventional designs, fabrication-induced performance degradation still occurs. The degree of deviation from the original design not only depends on the size and shape of its features, but also on the distribution of features and the surrounding environment, presenting complex, proximity-dependent behavior. Without proprietary fabrication process specifications, design corrections can only be made after calibrating fabrication runs take place. In this work, we introduce a general deep machine learning model that automatically corrects photonic device design layouts prior to first fabrication. Only a small set of scanning electron microscopy images of engineered training features are required to create the deep learning model. With correction, the outcome of the fabricated layout is closer to what is intended, and thus so too is the performance of the design. Without modifying the nanofabrication process, adding significant computation in design, or requiring proprietary process specifications, we believe our model opens the door to new levels of reliability and performance in next-generation photonic circuits.