Domain Adaptation for Image Classification of Defects in Semiconductor Manufacturing

In the semiconductor sector, due to high demand but also strong and increasing competition, time to market and quality are key factors in securing significant market share in various application areas. Thanks to the success of deep learning methods in recent years in the computer vision domain, Industry 4.0 and 5.0 applications, such as defect classification, have achieved remarkable success. In particular, Domain Adaptation (DA) has proven highly effective since it focuses on using the knowledge learned on a (source) domain to adapt and perform effectively on a different but related (target) domain. By improving robustness and scalability, DA minimizes the need for extensive manual re-labeling or re-training of models. This not only reduces computational and resource costs but also allows human experts to focus on high-value tasks. Therefore, we tested the efficacy of DA techniques in semi-supervised and unsupervised settings within the context of the semiconductor field. Moreover, we propose the DBACS approach, a CycleGAN-inspired model enhanced with additional loss terms to improve performance. All the approaches are studied and validated on real-world Electron Microscope images considering the unsupervised and semi-supervised settings, proving the usefulness of our method in advancing DA techniques for the semiconductor field.

Heterogeneous Domain Adaptation and Equipment Matching: DANN-based Alignment with Cyclic Supervision (DBACS)

Process monitoring and control are essential in modern industries for ensuring high quality standards and optimizing production performance. These technologies have a long history of application in production and have had numerous positive impacts, but also hold great potential when integrated with Industry 4.0 and advanced machine learning, particularly deep learning, solutions. However, in order to implement these solutions in production and enable widespread adoption, the scalability and transferability of deep learning methods have become a focus of research. While transfer learning has proven successful in many cases, particularly with computer vision and homogenous data inputs, it can be challenging to apply to heterogeneous data. Motivated by the need to transfer and standardize established processes to different, non-identical environments and by the challenge of adapting to heterogeneous data representations, this work introduces the Domain Adaptation Neural Network with Cyclic Supervision (DBACS) approach. DBACS addresses the issue of model generalization through domain adaptation, specifically for heterogeneous data, and enables the transfer and scalability of deep learning-based statistical control methods in a general manner. Additionally, the cyclic interactions between the different parts of the model enable DBACS to not only adapt to the domains, but also match them. To the best of our knowledge, DBACS is the first deep learning approach to combine adaptation and matching for heterogeneous data settings. For comparison, this work also includes subspace alignment and a multi-view learning that deals with heterogeneous representations by mapping data into correlated latent feature spaces. Finally, DBACS with its ability to adapt and match, is applied to a virtual metrology use case for an etching process run on different machine types in semiconductor manufacturing.